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Luminescent properties of europium titanium phosphate thin films deposited by atomic layer deposition

机译:原子层沉积法制备铕磷酸钛薄膜的发光特性

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摘要

In the present contribution we assess the luminescent properties of amorphous europium titanium phosphate thin films. The films have been deposited by atomic layer deposition, using the precursor combinations Eu(thd)3 (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) and O3, TiCl4 and H2O, and Me3PO4, H2O and O3 at a deposition temperature of 300 °C. UV light is absorbed in the (TiO6)8− complex and subsequently transferred to Eu3+, from which characteristic visible red emission takes place. The inclusion of phosphate is expected to reduce the symmetry around Eu3+ compared to the pure oxide structure, which should increase the f–f transition rate and improve the luminescence efficiency. The as deposited samples display a high degree of photobleaching when subjected to UV or X-rays. The bleaching rate has been quantified for the as deposited samples and can be controlled by adjusting the Ti-content in the samples. Annealing the samples at 500–700 °C increases both the photostability and the luminescence of all compositions, while annealing at 800 °C and above quenches the Eu3+ luminescence. Annealing at 1000 °C results in a broad NIR emission centred around 820 nm for most of the samples. The structure, roughness, thickness and composition of the deposited films have been studied by X-ray diffraction, atomic force microscopy, ellipsometry, and X-ray fluorescence, respectively. The optical properties have been characterized with excitation and photoluminescence spectroscopy and spectroscopic ellipsometry, while field emission scanning electron microscopy has been used to determine the morphology of the annealed samples.
机译:在目前的贡献中,我们评估了无定形p钛磷酸盐薄膜的发光特性。使用前驱体组合Eu(thd)3(thd = 2,2,6,6-四甲基-3,5-庚二酮)和O3,TiCl4和H2O,Me3PO4,H2O和O3的沉积温度为300°C。紫外光被(TiO6)8-络合物吸收,然后转移到Eu3 +,从那里发生特征性的可见红色发射。与纯氧化物结构相比,预计包含磷酸盐会降低Eu3 +周围的对称性,这将增加f–f跃迁速率并提高发光效率。沉积的样品在受到紫外线或X射线照射时显示出高度的光致漂白。漂白速率已针对沉积样品进行了量化,可以通过调整样品中的Ti含量来控制。在500–700°C下对样品进行退火可提高所有组合物的光稳定性和发光度,而在800°C及以上温度下进行退火可淬灭Eu3 +发光。在大多数样品上,在1000°C退火会导致820 nm附近的宽NIR发射。分别通过X射线衍射,原子力显微镜,椭圆偏振和X射线荧光研究了沉积膜的结构,粗糙度,厚度和组成。光学性质已通过激发和光致发光光谱法和椭圆偏振光谱法进行了表征,而场发射扫描电子显微镜已被用于确定退火样品的形态。

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